Selective Enhancement of SiO[sub 2] Etch Rate by Ar-Ion Implantation for Improved Etch Depth Control
Sun, Xin, Lu, Qiang, Takeuchi, Hideki, Balasubramanian, Sriram, King Liu, Tsu-JaeVolume:
10
Year:
2007
Language:
english
Journal:
Electrochemical and Solid-State Letters
DOI:
10.1149/1.2748634
File:
PDF, 205 KB
english, 2007