Diffusion and Activation of Ultra Shallow Boron Implants in...

Solid State Phenomena 2008 Vol. 131-133

Diffusion and Activation of Ultra Shallow Boron Implants in Silicon in Proximity of Voids

Marcelot, O., Claverie, A., Alquier, Daniel, Cayrel, Frédéric, Lerch, Wilfried, Paul, Silke, Rubin, L., Raineri, Vito, Giannazzo, Filippo, Jaouen, H.
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Volume:
131-133
Year:
2008
Language:
english
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/SSP.131-133.357
File:
PDF, 749 KB
english, 2008
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