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Advanced thermal processing of semiconductor materials in the millisecond range
W. Skorupa, W. Anwand, D. Panknin, M. Voelskow, R.A. Yankov, T. GebelVolume:
78
Year:
2005
Language:
english
Pages:
5
DOI:
10.1016/j.vacuum.2005.01.105
File:
PDF, 210 KB
english, 2005