Exact and reliable overlay metrology in nanoscale...

Journal of Micro/Nanolithography MEMS and MOEMS 2014 / 10 Vol. 13; Iss. 4

Exact and reliable overlay metrology in nanoscale semiconductor devices using an image processing method

Park, Jinkook, Shin, ChaeHo, Kim, Minkook, Kim, Junghwan, Park, JeongKyun, Kim, JungSoo, Jun, ChungSam, Yim, Yeny, Lee, Janghee
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Volume:
13
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.JMM.13.4.041409
Date:
October, 2014
File:
PDF, 3.23 MB
english, 2014
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