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Formation of polycrystalline SiGe thin films by the RF magnetron sputtering method with Ar–H2 mixture gases
Isao Nakamura, Toru Ajiki, Hirokazu Abe, Daisuke Hoshi, Masao IsomuraVolume:
80
Year:
2006
Language:
english
Pages:
4
DOI:
10.1016/j.vacuum.2005.11.032
File:
PDF, 190 KB
english, 2006