Impact of dose and energy of argon (40Ar+) and fluorine...

Vacuum 2006 Vol. 81; Iss. 3

Impact of dose and energy of argon (40Ar+) and fluorine (19F+) ion implantation on uniformity of silicon oxidation

Raj Kumar, M.S. Yadav, Kamal Kishore, Kumar Sambhawam, Sachin Goyal, D.N. Singh, P.J. George
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Volume:
81
Year:
2006
Language:
english
Pages:
5
DOI:
10.1016/j.vacuum.2006.04.001
File:
PDF, 163 KB
english, 2006
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