Applying RF current harmonics for end-point detection...

Vacuum 2007 Vol. 82; Iss. 3

Applying RF current harmonics for end-point detection during etching multi-layered substrates and cleaning discharge chambers with NF3 discharge

V. Lisovskiy, J.-P. Booth, K. Landry, D. Douai, V. Cassagne, V. Yegorenkov
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Volume:
82
Year:
2007
Language:
english
Pages:
7
DOI:
10.1016/j.vacuum.2007.04.035
File:
PDF, 273 KB
english, 2007
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