A role of parameters in RF PA CVD technology of a-C:N:H...

Vacuum 2008 Vol. 82; Iss. 10

A role of parameters in RF PA CVD technology of a-C:N:H layers

Karol Kyzioł, Stanisława Jonas, Katarzyna Tkacz-Śmiech, Konstanty Marszałek
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Volume:
82
Year:
2008
Language:
english
Pages:
5
DOI:
10.1016/j.vacuum.2008.01.008
File:
PDF, 371 KB
english, 2008
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