Influence of oxygen/argon pressure ratio on the morphology, optical and electrical properties of ITO thin films deposited at room temperature
Hai-Ning Cui, V. Teixeira, Li-Jian Meng, R. Martins, E. FortunatoVolume:
82
Year:
2008
Language:
english
Pages:
5
DOI:
10.1016/j.vacuum.2008.03.061
File:
PDF, 555 KB
english, 2008