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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Line-edge roughness and the ultimate limits of lithography
Mack, Chris A., Allen, Robert D.Volume:
7639
Year:
2010
Language:
english
DOI:
10.1117/12.848236
File:
PDF, 270 KB
english, 2010