Influence of the deposition pressure on the preparation of...

Vacuum 2008 Vol. 83; Iss. 2

Influence of the deposition pressure on the preparation of μc-Si:H thin films in hot-wire-assisted MWECR-CVD system

Xiu-Hong Zhu, Guang-Hua Chen, Mao-Sheng Zheng
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Volume:
83
Year:
2008
Language:
english
Pages:
5
DOI:
10.1016/j.vacuum.2008.05.024
File:
PDF, 430 KB
english, 2008
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