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Towards the sub-50 nm magnetic device definition: Ion beam etching (IBE) vs plasma-based etching
Xilin Peng, Stacey Wakeham, Augusto Morrone, Steven Axdal, Michael Feldbaum, Justin Hwu, Tom Boonstra, Yonghua Chen, Juren DingVolume:
83
Year:
2009
Language:
english
Pages:
7
DOI:
10.1016/j.vacuum.2008.12.003
File:
PDF, 447 KB
english, 2009