Diffusion of Pb in (100) Si under electron beam annealing following dual ion implantations of Pb/Ne, Pb/O and Pb/N
Andreas Markwitz, Fang Fang, Horst Baumann, Peter B. JohnsonVolume:
84
Year:
2010
Language:
english
Pages:
8
DOI:
10.1016/j.vacuum.2010.01.034
File:
PDF, 2.64 MB
english, 2010