Study of inductively coupled Cl2/BCl3 plasma process for...

Study of inductively coupled Cl2/BCl3 plasma process for high etch rate selective etching of via-holes in GaAs

D.S. Rawal, V.R. Agarwal, H.S. Sharma, B.K. Sehgal, R. Muralidharan, Hitendra K. Malik
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Volume:
85
Year:
2010
Language:
english
Pages:
6
DOI:
10.1016/j.vacuum.2010.08.022
File:
PDF, 1.00 MB
english, 2010
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