Study of inductively coupled Cl2/BCl3 plasma process for high etch rate selective etching of via-holes in GaAs
D.S. Rawal, V.R. Agarwal, H.S. Sharma, B.K. Sehgal, R. Muralidharan, Hitendra K. MalikVolume:
85
Year:
2010
Language:
english
Pages:
6
DOI:
10.1016/j.vacuum.2010.08.022
File:
PDF, 1.00 MB
english, 2010