SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Optical Microlithography XXI - Hybrid Hopkins-Abbe method for modeling oblique angle mask effects in OPC
Adam, Konstantinos, Lam, Michael C., Levinson, Harry J., Dusa, Mircea V.Volume:
6924
Year:
2008
Language:
english
DOI:
10.1117/12.776731
File:
PDF, 667 KB
english, 2008