![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Metrology, Inspection, and Process Control for Microlithography X - Water-soluble resist for environmentally friendly lithography
Lin, Qinghuang, Simpson, Logan L., Steinhaeusler, Thomas, Wilder, Michelle, Willson, C. Grant, Havard, Jennifer M., Frechet, Jean M. J., Jones, Susan K.Volume:
2725
Year:
1996
Language:
english
DOI:
10.1117/12.240092
File:
PDF, 482 KB
english, 1996