![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Study of EUVL mask defect inspection using 199-nm inspection tool with super-resolution method
Shigemura, Hiroyuki, Amano, Tsuyoshi, Arisawa, Yukiyasu, Suga, Osamu, Hashimoto, Hideaki, Saito, Masanori, Takeda, Masaya, Kikuiri, Nobutaka, Hirano, Ryoichi, Zurbrick, Larry S., Montgomery, M. WarrenVolume:
7488
Year:
2009
Language:
english
DOI:
10.1117/12.829748
File:
PDF, 1.69 MB
english, 2009