Impact of photoacid generator leaching on optics photocontamination in 193-nm immersion lithography
Liberman, VladimirVolume:
6
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.2712841
Date:
January, 2007
File:
PDF, 682 KB
english, 2007