SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Improved scatterometry time-to-solution using virtual reference
Cain, Jason P., Sanchez, Martha I., Vaid, Alok, Iddawela, Givantha, Tsai, Jamie, Wainreb, Gilad, Isbester, Paul, Kang, Byung Cheol (Charles), Klots, Michael, Katz, Yinon, Bozdog, Cornel, Sendelbach, MVolume:
9424
Year:
2015
Language:
english
DOI:
10.1117/12.2087232
File:
PDF, 1019 KB
english, 2015