Source for extreme ultraviolet lithography based on plasma...

Journal of Micro/Nanolithography MEMS and MOEMS 2012 / 05 Vol. 11; Iss. 2

Source for extreme ultraviolet lithography based on plasma sustained by millimeter-wave gyrotron radiation

Chkhalo, Nikolay I., Golubev, Sergei V., Mansfeld, Dmitry, Salashchenko, Nikolay N., Sjmaenok, Leonid A., Vodopyanov, Alexander V.
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Volume:
11
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.JMM.11.2.021123
Date:
May, 2012
File:
PDF, 1.77 MB
english, 2012
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