SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Metrology, Inspection, and Process Control for Microlithography XIV - Computer modeling of charging-induced electron beam deflection in electron beam lithography
Hwu, Justin J., Ko, Yeong-Uk, Joy, David C., Sullivan, Neal T.Volume:
3998
Year:
2000
Language:
english
DOI:
10.1117/12.386477
File:
PDF, 493 KB
english, 2000