SPIE Proceedings [SPIE SPIE Advanced Lithography - San...

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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - Nanopatterning with tailored molecules

Wallow, Thomas I., Hohle, Christoph K., Wieberger, Florian, Kolb, Tristan, Neuber, Christian, Ober, Christopher K., Schmidt, Hans-Werner
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Volume:
9051
Year:
2014
Language:
english
DOI:
10.1117/12.2047109
File:
PDF, 1.08 MB
english, 2014
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