![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Design-Process-Technology Co-optimization for Manufacturability VIII - Synthesis of lithography test patterns through topology-oriented pattern extraction and classification
Sturtevant, John L., Capodieci, Luigi, Shim, Seongbo, Chung, Woohyun, Shin, YoungsooVolume:
9053
Year:
2014
Language:
english
DOI:
10.1117/12.2046142
File:
PDF, 730 KB
english, 2014