SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - The rational design of polymeric EUV resist materials by QSPR modelling
Jack, Kevin, Liu, Heping, Blakey, Idriss, Hill, David, Yueh, Wang, Cao, Heidi, Leeson, Michael, Denbeaux, Greg, Waterman, Justin, Whittaker, Andrew, Lin, QinghuangVolume:
6519
Year:
2007
Language:
english
DOI:
10.1117/12.716213
File:
PDF, 234 KB
english, 2007