![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Structural effects of DNQ-PAC backbone on resist lithographic properties
Uenishi, Kazuya, Kawabe, Yasumasa, Kokubo, Tadayoshi, Slater, Sydney G., Blakeney, Andrew J., Ito, HiroshiVolume:
1466
Year:
1991
Language:
english
DOI:
10.1117/12.46362
File:
PDF, 593 KB
english, 1991