SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - Methods of controlling cross-linking in negative-tone resists
Wallow, Thomas I., Hohle, Christoph K., Lawson, Richard A., Chun, Jun Sung, Neisser, Mark, Tolbert, Laren M., Henderson, Clifford L.Volume:
9051
Year:
2014
Language:
english
DOI:
10.1117/12.2046616
File:
PDF, 1.05 MB
english, 2014