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Reactive Ion Etching in CF4 / O2 Gas Mixtures for Fabricating SiC Devices
Imaizumi, Masayuki, Tarui, Yoichiro, Sugimoto, Hiroshi, Tanimura, J., Takami, Tetsuya, Ozeki, TatsuoVolume:
338-342
Year:
2000
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.338-342.1057
File:
PDF, 301 KB
2000