SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - 193-nm single-layer positive resists: building etch resistance into a high-resolution imaging system
Allen, Robert D., Wallraff, Gregory M., Di Pietro, Richard A., Hofer, Donald C., Kunz, Roderick R., Allen, Robert D.Volume:
2438
Year:
1995
Language:
english
DOI:
10.1117/12.210396
File:
PDF, 1.23 MB
english, 1995