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Highly Crystalline Intrinsic Microcrystalline Silicon Films Using SiF4/Ar/H2 Glow Discharge Plasma
Kumar, Satyendra, Brenot, R., Kalache, Billel, Tripathi, V., Vanderhaghen, R., Drevillon, B., Roca i Cabarrocas, PereVolume:
80-81
Year:
2001
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/SSP.80-81.237
File:
PDF, 411 KB
2001