SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Metrology, Inspection, and Process Control for Microlithography XV - Measurement precision of optical scatterometry
Logofatu, Petre-Catalin, McNeil, John R., Sullivan, Neal T.Volume:
4344
Year:
2001
Language:
english
DOI:
10.1117/12.436770
File:
PDF, 223 KB
english, 2001