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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Alternative Lithographic Technologies VII - Fabrication of functional electromechanical nanowire resonators by focused ion-beam (FIB) implantation
Resnick, Douglas J., Bencher, Christopher, Llobet, J., Sansa, M., Borrisé, X., Pérez-Murano, F., Gerbolés, M.Volume:
9423
Year:
2015
Language:
english
DOI:
10.1117/12.2085818
File:
PDF, 579 KB
english, 2015