SPIE Proceedings [SPIE SPIE Advanced Lithography - San...

  • Main
  • SPIE Proceedings [SPIE SPIE Advanced...

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Alternative Lithographic Technologies VII - Fabrication of functional electromechanical nanowire resonators by focused ion-beam (FIB) implantation

Resnick, Douglas J., Bencher, Christopher, Llobet, J., Sansa, M., Borrisé, X., Pérez-Murano, F., Gerbolés, M.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
9423
Year:
2015
Language:
english
DOI:
10.1117/12.2085818
File:
PDF, 579 KB
english, 2015
Conversion to is in progress
Conversion to is failed