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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Alternative Lithographic Technologies III - Development of realistic potentials for the simulation of directed self-assembly of PS-PMMA di-block copolymers
Lawson, Richard A., Ludovice, Peter J., Henderson, Clifford L., Herr, Daniel J. C.Volume:
7970
Year:
2011
Language:
english
DOI:
10.1117/12.879578
File:
PDF, 663 KB
english, 2011