Centimeter-Scale Subwavelength Photolithography Using...

Langmuir 2015 / 05 Vol. 31; Iss. 17

Centimeter-Scale Subwavelength Photolithography Using Metal-Coated Elastomeric Photomasks with Modulated Light Intensity at the Oblique Sidewalls

Wu, Jin, Liu, Yayuan, Guo, Yuanyuan, Feng, Shuanglong, Zou, Binghua, Mao, Hui, Yu, Cheng-han, Tian, Danbi, Huang, Wei, Huo, Fengwei
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Volume:
31
Language:
english
Journal:
Langmuir
DOI:
10.1021/acs.langmuir.5b00568
Date:
May, 2015
File:
PDF, 2.10 MB
english, 2015
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