![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - Multi-layer reticle (MLR) strategy application to double-patterning/double-exposure for better overlay error control and mask cost reduction
Yamamoto, Yasuhisa, Rigby, Rodney, Sweis, Jason, Naber, Robert J., Kawahira, HiroichiVolume:
6730
Year:
2007
Language:
english
DOI:
10.1117/12.746158
File:
PDF, 707 KB
english, 2007