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Silicon Nitride Films Deposited by Low Pressure Chemical Vapor Deposition from SiH4-NH3-N2 System
Liu, Xue Jian, Huang, Zhi Yong, Huang, Li PingVolume:
264-268
Year:
2004
Language:
english
Journal:
Key Engineering Materials
DOI:
10.4028/www.scientific.net/KEM.264-268.643
File:
PDF, 184 KB
english, 2004