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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Emerging Lithographic Technologies V - High-accuracy aerial image measurement for electron-beam projection lithography
Yahiro, Takehisa, Hirayanagi, Noriyuki, Morita, Kenji, Irita, Takeshi, Yamamoto, Hajime, Suzuki, Shohei, Shimizu, Hiroyasu, Kawata, Shintaro, Okino, Teruaki, Suzuki, Kazuaki, Dobisz, Elizabeth A.Volume:
4343
Year:
2001
Language:
english
DOI:
10.1117/12.436679
File:
PDF, 454 KB
english, 2001