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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Radiation and photochemistry of onium salt acid generators in chemically amplified resists
Tagawa, Seiichi, Nagahara, Seiji, Iwamoto, Toshiyuki, Wakita, Masanori, Kozawa, Takahiro, Yamamoto, Yukio, Werst, David, Trifunac, Alexander D., Houlihan, Francis M.Volume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388304
File:
PDF, 1.16 MB
english, 2000