![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Alternative Lithographic Technologies V - Healing LER using directed self assembly: treatment of EUVL resists with aqueous solutions of block copolymers
Chuang, Ya-Mi, Tong, William M., Resnick, Douglas J., Cheng, Han-Hao, Jack, Kevin, Whittaker, Andrew, Blakey, IdrissVolume:
8680
Year:
2013
Language:
english
DOI:
10.1117/12.2012488
File:
PDF, 894 KB
english, 2013