Impact of polarization on an attenuated phase shift mask...

Journal of Micro/Nanolithography MEMS and MOEMS 2006 / 10 Vol. 5; Iss. 4

Impact of polarization on an attenuated phase shift mask with ArF hyper-numerical aperture lithography

Sato, Takashi
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Volume:
5
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.2397065
Date:
October, 2006
File:
PDF, 1014 KB
english, 2006
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