SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Optical/Laser Microlithography VII - Attenuating phase-shift mask by thermal oxidation of chrome
O'Grady, David S., Wilber, Phil B., Brunner, Timothy A.Volume:
2197
Year:
1994
Language:
english
DOI:
10.1117/12.175413
File:
PDF, 501 KB
english, 1994