Surface roughness investigation of 157- and 193-nm polymer platforms using different etch conditions
Hohle, ChristophVolume:
4
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.2131101
Date:
October, 2005
File:
PDF, 812 KB
english, 2005