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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Development of optically transparent cyclic olefin photoresist binder resins
Rhodes, Larry F., Chang, Chun, Burns, Cheryl, Barnes, Dennis A., Bennett, Brian, Seger, Larry, Wu, Xiaoming, Sobek, Andy, Mishak, Mike, Peterson, Craig, Langsdorf, Leah, Hada, Hideo, Shimizu, Hiroaki,Volume:
5753
Year:
2005
Language:
english
DOI:
10.1117/12.600051
File:
PDF, 1.15 MB
english, 2005