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Resist roughness evaluation and frequency analysis: metrological challenges and potential solutions for extreme ultraviolet lithography
Pret, Alessandro VaglioVolume:
9
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.3531982
Date:
October, 2010
File:
PDF, 1.34 MB
english, 2010