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The Influence of the Use of Different Catalyzers in Hot-Wire CVD for the Deposition of Polycrystalline Silicon Thin Films
van Veenendaal, P.A.T.T., Rath, Jatindra K., Gijzeman, O.L.J., Schropp, Ruud E.I.Volume:
80-81
Year:
2001
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/SSP.80-81.53
File:
PDF, 385 KB
2001