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ECS Transactions [ECS 217th ECS Meeting - Vancouver, Canada (April 25 - April 30, 2010)] - (Invited) Degradation in HfSiON Film Induced by Electrical Stress Application
Hasunuma, Ryu, Tamura, Chihiro, Nomura, Tsuyoshi, Kikuchi, Yuuki, Ohmori, Kenji, Sato, Motoyuki, Uedono, Akira, Chikyow, Toyohiro, Shiraishi, Kenji, Yamada, Keisaku, Yamabe, KikuoYear:
2010
Language:
english
DOI:
10.1149/1.3372581
File:
PDF, 453 KB
english, 2010