New approaches for scatterometry-based metrology for...

Journal of Micro/Nanolithography MEMS and MOEMS 2011 / 01 Vol. 10; Iss. 1

New approaches for scatterometry-based metrology for critical distance and overlay measurement and process control

Bhattacharyya, Kaustuve
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Volume:
10
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.3532076
Date:
January, 2011
File:
PDF, 819 KB
english, 2011
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