Electrical Characterization of Defects Introduced During...

Materials Science Forum 1997 Vol. 258-263

Electrical Characterization of Defects Introduced During Plasma-Based Processing of GaAs

Auret, F.D., Goodman, S.A., Myburg, G., Meyer, W.E., Deenapanray, Prakash N.K., Murtagh, M., Ye, Shu-Ren, Masterson, H.J., Beechinor, J.T., Crean, G.M.
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Volume:
258-263
Year:
1997
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.258-263.1045
File:
PDF, 511 KB
1997
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