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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Automated imprint mask cleaning for step-and-flash imprint lithography
Singh, Sherjang, Chen, Ssuwei, Selinidis, Kosta, Fletcher, Brian, McMackin, Ian, Thompson, Ecron, Resnick, Douglas J., Dress, Peter, Dietze, Uwe, Schellenberg, Frank M., La Fontaine, Bruno M.Volume:
7271
Year:
2009
Language:
english
DOI:
10.1117/12.814290
File:
PDF, 825 KB
english, 2009