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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - Use of multiple azimuthal angles to enable advanced scatterometry applications
Sendelbach, Matthew, Vaid, Alok, Herrera, Pedro, Dziura, Ted, Zhang, Michelle, Srivatsa, Arun, Raymond, Christopher J.Volume:
7638
Year:
2010
Language:
english
DOI:
10.1117/12.846692
File:
PDF, 336 KB
english, 2010