SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advances in Resist Materials and Processing Technology XXIX - Focus improvement with NIR absorbing underlayer attenuating substructure reflectivity
Huang, Wu-Song, Goldfarb, Dario, Li, Wai-kin, Glodde, Martin, Noda, Kazumi, Tachibana, Seiichiro, Ohashi, Masaki, Owe-Yang, Dah-Chung, Kinsho, Takeshi, Somervell, Mark H., Wallow, Thomas I.Volume:
8325
Year:
2012
Language:
english
DOI:
10.1117/12.916240
File:
PDF, 553 KB
english, 2012